Prediction of multiple-feature effects in plasma etching
نویسندگان
چکیده
منابع مشابه
Prediction of multiple-feature effects in plasma etching
Charging and topography evolution simulations during plasma etching of dense line-and-space patterns reveal that multiple-feature effects influence critically the etch profile characteristics of the various lines. By including neighboring lines, the simulation predicts a peculiar notching behavior, where the extent of notching varies with the location of the line. Feature-scale modeling can no ...
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Investigations of surface reactions during C2F6 plasma etching of SiO2 with equipment and feature scale models
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ژورنال
عنوان ژورنال: Applied Physics Letters
سال: 1997
ISSN: 0003-6951,1077-3118
DOI: 10.1063/1.118878